You are currently viewing SemiWiki as a guest which gives you limited access to the site. To view blog comments and experience other SemiWiki features you must be a registered member. Registration is fast, simple, and absolutely free so please, join our community today!

  • Semiconductor Expert Forum RSS Feed

    by Published on 05-14-2019 10:00 AM
    1. Categories:
    2. Semiconductor Design,
    3. ANSYS, Inc.,
    4. FinFET
    Article: We Live on a Radioactive Planet-caption-ansys-redhawk-path-fx.jpg

    Designing with advanced-nodes FinFETs such as 7nm node involves a more complex process than prior nodes. As secondary physical effects are no longer negligible, the traditional margin-based approach applied at various design abstraction levels is considered ineffective. Coupled with the increase of ...
    by Published on 05-14-2019 05:00 AM
    1. Categories:
    2. Semiconductor Services,
    3. Semiconductor Intelligence
    SOCFIT Circuit Level Wiki-may-2019-ee.jpg

    The U.S. is showing steady growth in electronics production. Three-month-average change versus a year ago (3/12) in March 2019 was 6.2%, the 12th consecutive month of growth above 5%. China electronics production is decelerating, with March 2019 3/12 growth of 8.2%, ...
    by Published on 05-13-2019 10:00 AM
    1. Categories:
    2. Synopsys,
    3. TSMC,
    4. Events,
    5. S2C,
    6. Automotive,
    7. Artificial Intelligence,
    8. Intrinsix
    Article: Wally Rhines: Name That Graph!-silicon-catalyst-enabling-innovation-min.jpg

    Hardware is roaring back into prominence in technology innovation, from advanced cars to robots, smart homes and smart cities, 5G communication and the burgeoning electronification of industry, medicine and utilities. While software continues to play a role, all of these capabilities depend fundamentally ...
    by Published on 05-13-2019 05:00 AM
    1. Categories:
    2. Automotive
    Article: TSMC (Lincoln) vs Samsung (Clinton) vs Intel (Washington)-uberr-sandcastle.jpg

    As Uber’s initial public offering arrives this is a good moment to consider what kind of employment model for the future we all, as employees and employers, would prefer to adopt: Amazon or Uber?

    One of my sons has interviewed with Amazon. The other has his Amazon moment today. My across-the-street neighbor works for Amazon Web Services. I don’t know anyone that works for or has “interviewed” with Uber – though I have spoken with Uber drivers all over the world.

    It is worth considering the two different value propositions posed by these pivotal employers and purported economic engines. Amazon is already the second largest employer in the U.S. with 566,000 employees. Uber employs ...
    by Published on 05-13-2019 05:00 AM
    1. Categories:
    2. Semiconductor Services,
    3. Semiconductor Advisors
    Article: Modern Data Management-china-us-trade-war.jpg

    We have been very vocal and perhaps the first to warn of the risks to the semiconductor and semiconductor equipment industry from the China trade war with the US. It seems that the war is now fully upon us with the imposition of 25% tariffs by the US and promised retribution by China. The semiconductor industry is at the leading edge of the "made in China 2025" program that the White House would like to blunt, and along with it the current trade imbalance.

    We had also warned that the stocks have gotten too far ahead of them ...
    by Published on 05-13-2019 05:00 AM
    1. Categories:
    2. Semiconductor Manufacturers,
    3. Events
    Article: When the lines on the roadmap get closer together-figure-1.jpg

    Part 4 of this series discussed how a transistor Extension could be fabricated in a planar device without using an implant operation, and is instead formed using a preferential etch followed by a selective epitaxial deposition. This final installment of the series will present the formation of an Extension in a FinFET transistor using the same etch and deposition methodology.

    As in the planar case, this technique for fabricating ...
    by Published on 05-10-2019 12:00 PM
    1. Categories:
    2. Events,
    3. FinFET
    -figure-1.jpg

    Perhaps the most innovative and effective Extension implant does not involve an implant at all, but is instead an etch followed by a selective epitaxial deposition.

    In this Extension fabrication methodology the Source/Drains regions in a planar device are etched away in the normal fashion to accommodate the replacement Source/Drain stressor material ...
    by Published on 05-07-2019 10:00 AM
    1. Categories:
    2. Artificial Intelligence
    Article: TSMC (Lincoln) vs Samsung (Clinton) vs Intel (Washington)-cranium-3244100_1280.jpg

    “AI is the biggest risk we face as a civilization.” Words from the visionary Tesla CEO, Elon Musk. After each iteration of innovation, artificial intelligence edges closer to replicating the human brain; people fear that AI would soon steal their ...
    by Published on 05-06-2019 10:00 AM
    1. Categories:
    2. Artificial Intelligence
    Article: Can Japan Regain Semiconductor Leadership?-blockchain-ai-perfect-match.jpg

    Blockchain and Artificial Intelligence are two of the hottest technology trends right now. Even though the two technologies have highly different developing parties and applications, researchers have been discussing and exploring their combination [6].

    PwC predicts that by 2030 AI will add up to $15.7 trillion to the world economy, and as a result, global GDP will rise by 14%. According to Gartner’s prediction, business value added by blockchain technology will increase to $3.1 trillion by the same year.

    ...
    by Published on 05-06-2019 05:00 AM
    1. Categories:
    2. Events,
    3. FinFET
    Article: Can Japan Regain Semiconductor Leadership?-figure-1.jpg

    The problem of traditional FinFET Extension Implant doping concerns the awkward 3-dimensional structure of the fin. Because the Extension Implant defines the conductive electrical pathway between the Source/Drains and the undoped channel portion of the fin, it is essential that the fin be uniformly doped all three of its surfaces (the two sides and the top of the fin). The use of a short Amorphous ...

    Page 2 of 11 1 2 3 4 5 6 7 8
  • Trending Now Links

  • Google Translate